我知道我又要给大家种草了。。。。首先，我必须支持马甲甲甲mm，真的不会磨皮肤。但是原理我就不知道，因为懒得看。我和马甲甲甲 mm 一样，我的脸不会红，但是会痛。而且是刺刺得痛。所以我觉得肯定不会错。
第二，用完这几天，我没有觉得皮肤松弛，反而觉得紧实了许多。因为你用完之后，一定会放lotion all these。。当你看到你的脸白白红红，你会不由自主地按摩你得脸暇。至少我觉得是这样。
第三，我没有懒惰，每天都在用， 早上晚上一齐用。白里通红的感觉是真真正正看得到的！！！
对不起，我有错，我又给大家种草了。。。
原理因该和megasonic一样，用来清洗，又不会伤表面
问一下读Chemistry 或者semicon的同学有可能懂而且megasonic只是用Distill water哦
这把刷子用水洗脸因该也干净的。。。问题是。。。操作上有难度。。。怎么让水乖乖留在脸上
Megasonic Cleaning is a type of Acoustic cleaning, related to Ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is currently used in wafer cleaning.
Similar to Ultrasonic cleaning, megasonics utilizes a transducer, usually composed of Piezoelectric Crystals to create megasonic energy. Megasonic energy is of a higher frequency (800–2000 kHz) than typical ultrasonic cleaners (<100 kHz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.
Megasonics cleaning compared to ultrasonic cleaning - The difference between ultrasonic cleaning and megasonics cleaning lies in the frequency that is used to generate the acoustic waves. Ultrasonic cleaning uses lower frequencies; it produces random cavitation. Megasonics cleaning uses higher frequencies at 1000 kHz; it produces controlled cavitation.
An important distinction between the two methods is that the higher megasonic frequencies do not cause the violent cavitation effects found with ultrasonic frequencies. This significantly reduces or eliminates cavitation erosion and the likelihood of surface damage to the product being cleaned. Parts that would be damaged by ultrasonic frequencies or cavitation effects can often be cleaned without damage in a megasonic bath using the same solution.
With ultrasonics, cavitation occurs throughout the tank, and all sides of submerged parts are cleaned. With megasonics, only the side of the part that is facing the transducer(s) is cleaned.
这把刷子用水洗脸因该也干净的。。。问题是。。。操作上有难度。。。怎么让水乖乖留在脸上
Megasonic Cleaning is a type of Acoustic cleaning, related to Ultrasonic cleaning. It is a gentler cleaning mechanism, less likely to cause damage, and is currently used in wafer cleaning.
Similar to Ultrasonic cleaning, megasonics utilizes a transducer, usually composed of Piezoelectric Crystals to create megasonic energy. Megasonic energy is of a higher frequency (800–2000 kHz) than typical ultrasonic cleaners (<100 kHz). As a result, the cavitation that occurs is gentler and on a much smaller scale. Megasonics are currently used mainly in the silicon industry.
Megasonics cleaning compared to ultrasonic cleaning - The difference between ultrasonic cleaning and megasonics cleaning lies in the frequency that is used to generate the acoustic waves. Ultrasonic cleaning uses lower frequencies; it produces random cavitation. Megasonics cleaning uses higher frequencies at 1000 kHz; it produces controlled cavitation.
An important distinction between the two methods is that the higher megasonic frequencies do not cause the violent cavitation effects found with ultrasonic frequencies. This significantly reduces or eliminates cavitation erosion and the likelihood of surface damage to the product being cleaned. Parts that would be damaged by ultrasonic frequencies or cavitation effects can often be cleaned without damage in a megasonic bath using the same solution.
With ultrasonics, cavitation occurs throughout the tank, and all sides of submerged parts are cleaned. With megasonics, only the side of the part that is facing the transducer(s) is cleaned.
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